Nanocrystalline silicon thin films by RF plasma enhanced chemical vapour deposition
Document Type
Article
Publication Date
1-1-2006
Abstract
A plasma enhanced chemical vapour deposition (PECVD) system was designed and built in-house for the deposition of nanocrystalline silicon thin films. In this work, nanocrystalline slicon thin films were deposited at different rf(radio-frequency) power with the silane to hydrogen partial pressure ratio fixed. X-ray diffraction (XRD) and Raman spectroscopy measurements were done to investigate the structural properties of the films. Optical transmittance measurements were carried out to determine various optical parameters of these films. The rf power showed strong influence on the structural and optical properties of the nanocrystalline silicon films produced.
Keywords
PECVD, nanocrystalline silicon thin films.
Divisions
PHYSICS
Publication Title
Jurnal Fizik Malaysia
Volume
27
Issue
3 & 4