Effect of seed layer on the growth of zinc oxide nanowires by chemical bath deposition method

Document Type

Article

Publication Date

4-1-2022

Abstract

This study concentrated on the effect of the ZnO seed layer on the growth of ZnO nanowires by the chemical bath deposition method. Multilayer coatings were used to control the thickness of the seed layer of one layer, three layers, and five layers. The seed layer thickness was measured using a profilometer at 14.43, 33.31, and 53.13 nm for one-layer, three-layer, and five-layer samples, respectively. The samples were then immersed in a chemical bath deposition solution at 90 degrees C for 3 h to allow ZnO nanowires to grow. The X-ray diffraction (XRD) pattern of seed layers revealed a polycrystalline wurtzite structure with (101) orientation as the dominant peak in all samples. Field emission scanning electron microscopy (FESEM) revealed that ZnO nanowires grown in a single layer have a flower-like structure, whereas ZnO nanowires grown in three and five layers have a rod-like structure. Further, ImageJ software revealed that the diameter and length of the ZnO nanowires were in the 40-90 nm and 100-900 nm ranges, respectively. The five-layer sample had the highest density of ZnO nanowires at 668 mu m(-2), followed by the three-layer sample and the one-layer sample. However, the ZnO nanowires in the five-layer and one-layer samples are not vertically aligned. On the other hand, the three-layer sample had the best vertical alignment of this group of samples.

Keywords

ZnO nanowires, Seed layer, XRD, FESEM, Atomic force microscopy (AFM), Thickness

Divisions

nanotechnology

Funders

Universiti Putra Malaysia [Grant No: 9457700 & 9456800],Ministry of Education Malaysia (Fundamental Research Grant Scheme (FRGS)) [Grant No: FRGS/1/2017/STG07/UPM/02/10 & FRGS/2/2013/ST05/UPM/02/3],Ministry of Education Malaysia (Exploratory Research Grant Scheme (ERGS)) [Grant No: 5527188]

Publication Title

Coatings

Volume

12

Issue

4

Publisher

MDPI

Publisher Location

ST ALBAN-ANLAGE 66, CH-4052 BASEL, SWITZERLAND

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