Physical vapour deposition of Zr-based nano films on various substrates: A review
Document Type
Article
Publication Date
1-1-2022
Abstract
Physical vapor deposition (PVD) is a thin film fabrication process in the semiconductor industry. This review paper discusses the different types of PVD methods such as sputtering, cathodic arc deposition, pulsed laser deposition, and ion plating that could be employed in order to fabricate nanoscale thin films. This paper focuses on reviewing Zr-based nanoscale thin film properties, including the transformation of Zr to ZrO2 based nanofilms as high-k gate dielectrics. Additionally, its corrosion, mechanical and degradation resistance were thoroughly analysed. These properties are affected by gas flow rate changes, temperature, and crystallinity and are further discussed in each section. Thus, this review paper informs researchers of the thin films progress to date. Understanding the influence of PVD process parameters in fabricating Zr-based nanoscale thin film is vital for its long-term continuous improvement.
Keywords
PVD, Sputtering, Corrosion, Zirconium oxynitride, Dielectric, Nanofilms
Divisions
nanocat
Funders
University of Malaya, via Impact-Oriented Interdisciplinary Research Grant (IIRG) Program (Grant No: IIRG018B-2019)
Publication Title
Current Nanoscience
Volume
18
Issue
3
Publisher
Bentham Science Publishers
Publisher Location
EXECUTIVE STE Y-2, PO BOX 7917, SAIF ZONE, 1200 BR SHARJAH, U ARAB EMIRATES