Thermoelectric properties of Indium doped skutterudite thick film synthesized by a facile technique of electrochemical deposition
Document Type
Article
Publication Date
9-1-2023
Abstract
Doped/filled skutterudites are much studied materials due to their excellent thermoelectric performance. However, their synthesis and preparation is complicated. This work synthesized indium (In) doped cobalt triantimonide (CoSb3) skutterudite thick films using a facile electrochemical deposition technique through chronoamperometric steps for 2 h. The nominal composition of In element is found in the range of 0.55-0.23 for a stoichiometric condition of In doped CoSb3 thick films. The early crystal growth of In doped films shows instantaneous nucleation and is controlled by the charge transfer process with diffusion coefficient, D of 10(-5) cm(2)/s. The incorporation of In into the interstitial sites of CoSb3 cages is evident from the lattice constant (a) expansion as observed in XRD. The optimum Seeback coefficient (S) of the 0.5 mmol In doped CoSb3 thick film is -89.84 mu V/K at 282 K, due to an increase in the carrier concentration (n similar to 10(20) cm(-3)). The negative S is due to the electron donor behaviour of the In. Meanwhile, high electrical conductivity, sigma value (14.26 kS/m) contributes to a power factor (S-2 sigma) increment of 115.11 mu W/(m center dot K-2). The result shows a promising thermoelectric property of doped skutterudite synthesized by electrochemical deposition technique. (c) 2023 The Authors. Published by Elsevier B.V. on behalf of The Chinese Ceramic Society. This is an open access article under the CC BY license (http://creativecommons.org/licenses/by/4.0/).
Keywords
Indium, Electrochemical deposition, Thermoelectric, Thick film, Skutterudites
Divisions
mechanical,universiti
Funders
Universiti Malaya, Malaysia,Micro/Nanomachining Research Education Center (MNC) of Tohoku University, Japan,Ministry of Education of Malaysia (GPF003A-2018)
Publication Title
Journal of Materiomics
Volume
9
Issue
5
Publisher
Elsevier
Publisher Location
RADARWEG 29, 1043 NX AMSTERDAM, NETHERLANDS