Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film
Document Type
Article
Publication Date
11-15-2022
Abstract
Thin film technologies in terms of preparation and fabrication are of great importance in various fields, such as integrated circuits (IC), LCD monitors, photovoltaics, solar cells and sensors. Tellurium, as a narrow bandgap semiconductor, has attracted much attention due to its rich optical and electrical properties. Taking advantage of these properties, its films have been explored in recent years as saturable absorbers, gas sensors, and ther-moelectric materials. However, it is challenging to control the growth of the specific morphology of tellurium films. In this work, based on the electrodeposition challenge, we systematically investigated the electrodepo-sition process of tellurium films. It was found that the CV curves of electrodeposited tellurium shift in the pos-itive direction with increasing deposition time. In addition, the stabilized potential was determined based on the stable deposition peak potential after a certain deposition time. Moreover, three different additives, namely polyvinyl alcohol (PVA), tartaric acid (TA) and sodium lignosulfonate (SLS), were adopted to manipulate the morphology of as-deposited tellurium films. A rational route to deposit tellurium films with various morpholo-gies have been established.
Keywords
Electrochemical deposition, Temperature, Performance, Improvement, Alcohol, Copper, Acid
Divisions
mechanical
Funders
National Key Research and Development Program of China (Grant No: 2021YFA0718700),National Natural Science Foundation of China (NSFC) (Grant No: 52172259),Institute of Physics of the Chinese Academy of Sciences,Faculty of Engineering, Universiti Malaya, Malaysia
Publication Title
Journal of Electroanalytical Chemistry
Volume
925
Publisher
Elsevier Science Sa
Publisher Location
PO BOX 564, 1001 LAUSANNE, SWITZERLAND