Low-temperature growth of graphene nanoplatelets by hot-wire chemical vapour deposition
Document Type
Article
Publication Date
4-15-2021
Abstract
With the increasing demand for large-area graphene due to its versatility, there is an imminent requirement for scalable, low-temperature, and high yield growth procedures. In this study, the fabrication of large-area graphene nanoplatelets directly grown on tungsten (W) nanoparticles coated c-Si and quartz substrates by hot-wire chemical vapour deposition was demonstrated. A large area of single and bilayer graphene grown over W adatoms via controlled argon (Ar) plasma treatment varied from 0.5 to 10 min. The finest quality of continuous graphene layer up to an area of 2.56 x 10(4) mu m(2) was prepared at the optimised condition of 1 min, and verified through transmission electron microscopy in conjunction with energy dispersive X-ray, atomic force microscopy, and Raman spectroscopy. The prepared thin film of the carbon layer has excellent optical transparency (> 70%) and lower sheet resistance up to 718.3 Omega/sq. A detailed growth mechanism is proposed for the nucleation of graphene nanoplatelets under the influence of Ar plasma treatment on W nanoparticles.
Keywords
HWCVD, Graphene, Nanoplatelets, Raman mapping, Tungsten nanoparticles
Divisions
Science
Funders
Research University Faculty Programme (University of Malaya) [Grant No: GPF034B-2018],Newton Advanced Fellowship [Grant No: IF003-2017@NA16010 & RK006-2019],University of Sussex strategic development fund
Publication Title
Surface and Coatings Technology
Volume
411
Publisher
Elsevier
Publisher Location
PO BOX 564, 1001 LAUSANNE, SWITZERLAND