Disilane doping of semi-polar (11-22) n-GaN: The impact of terrace-like evolution toward the enhancement of the electrical properties

Document Type

Article

Publication Date

2-28-2021

Abstract

Semi-polar (11-22) n-type gallium nitride thin films with various disilane doping levels were deposited via metal-organic chemical vapor deposition. The impact of the dissimilar disilane doping levels on the crystal, morphological, strain, and electrical properties was extensively studied. An X-ray rocking curve analysis demonstrated an improved crystal quality with enhanced terrace-like features using 15 standard cubic centimeters per minute of disilane doping. A closely packed step terrace-like feature was exhibited, reducing the density of arrowhead-like features. This facilitated a smoother surface with a root mean square surface roughness of 5.7 nm. Raman spectroscopy revealed that using an intermediate disilane flux reduced the compressive strain. An electrical analysis also showed that a moderate disilane doping level improved the carrier concentration and mobility to 1.3 x 10(18) cm(-3) and 99.3 cm(-2). V-1. s(-1), respectively.

Keywords

Disilane, Electrical properties, n-Type gallium nitride, Semi-polar, Terrace-like features

Divisions

Science

Funders

Ministry of Higher Education (MOHE) for the Long-Term Research Grant Scheme (LRGS) (LR001A-2016A),Universiti Malaya UMRG (RP039B-18AFR)

Publication Title

Thin Solid Films

Volume

720

Publisher

Elsevier

Publisher Location

PO BOX 564, 1001 LAUSANNE, SWITZERLAND

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