Resistless nano-etching of UV-irradiated vinyl-functional silsesquioxane thin film by alcohol-alkaline solution
Document Type
Article
Publication Date
1-1-2021
Abstract
Defining optical thin film-based components such as waveguides, microlens, etc. typically encounter dimensional-based challenges especially when it comes to nano-dimensional features processing. This work focused on the optimization of wet etching process on the photosensitive organic-inorganic thin film in which desired pattern from UV-exposed photolithographic technique was successfully defined. Dissolution of the non-exposed areas was performed using a mixture of alcohol-alkaline solution and parameters such as concentration of etchant and etching time have been studied for the impact on morphology, topography, and optical properties. The optical properties of film thickness indicated that the non-exposed areas experienced thickness loss with low etchant contributed to the steady-state thickness reduction than the higher concentration of etchant used, whereas the refractive index is maintained throughout the process. Changes in topography properties indicated that surface features of arithmetical surface mean height, Sa exhibited that film smoothness and textural gross shapes are greatly enhanced by the combination of composition of etchant ions and etching duration. © 2021 International Scientific Organization. All Rights Reserved.
Keywords
Organic-inorganic, Thin film, UV micro-patterning, Wet etching
Divisions
Science,CHEMISTRY
Publication Title
International Journal of Chemical and Biochemical Sciences
Volume
20
Publisher
International Scientific Organization