Photoelectrochemical behavior of AlxIn1−xN thin films grown by plasma-assisted dual source reactive evaporation
Document Type
Article
Publication Date
1-1-2016
Abstract
In this work the dependence of photoelectrochemical (PEC) behavior of AlxIn1−xN (0.48 ≤x ≤ 0.66) thin films grown by plasma-assisted dual source reactive evaporation, on the plasma dynamics and the alloys properties was studied. The influence of nitrogen flow rate on the compositional, morphological, structural and optical properties of the as-prepared films were investigated using X-ray photoelectron spectroscopy (XPS), Field emission scanning electron microscopy (FESEM), micro Raman spectroscopy and UV–vis spectroscopy. The PEC study of the as-grown AlxIn1−xN thin films targeted for water splitting application were performed in the presence of simulated solar irradiation of AM 1.5G (100 mW/cm2). The PEC results revealed that the photocurrent for the AlxIn1−xN thin film grown at nitrogen flow rate of 80 sccm is ∼10-fold higher than the dark current. From the Mott–Schottky (MS) plots it was deduced that by increasing N2flow rate up to 80 sccm, the flat band potential shifts toward more negative values. The good photoelectrochemical behavior of AlxIn1−xN thin films showed that this material could be a potential candidate for PEC water splitting.
Keywords
AlxIn1−xN, Plasma-assisted deposition, Photoelectrochemical cells, Water splitting, Hydrogen production
Divisions
PHYSICS
Funders
University of Malaya, High Impact Research (HIR) fund of UM.C/HIR/MOHE/SC/06,Ministry of Higher Education Fundamental Research Grant Scheme (FRGS) of FP009-2013B,University of Malaya postgraduate research Fund (PPP) of PG081-2012B
Publication Title
Journal of Alloys and Compounds
Volume
670
Publisher
Elsevier