Channel resolution enhancement through scalability of nano/micro-scale thickness and width of SU-8 polymer based optical channels using UV lithography
Document Type
Article
Publication Date
1-1-2018
Abstract
This paper reports on an approach for fabrication of micro-channels with nanometer thickness achieved by optimization of UV lithography processes. Rectangular micro-channels with a staple edge are fabricated over the surface of a silicon wafer substrate in which a sub-micron layer of diluted SU-8 thin film has been coated. The optimization of the process parameters includes the duration of a two-step pre- and post-baking process, UV exposure dosage, and finally chemical developing time with constant agitation. This produces recipe produces micro-channels with high contrast edges and thickness below 100 nm. The dimensions achieved using this approach has potential applications in sub-micron optical waveguides and nanoelectromechanical (NEMS) devices.
Keywords
Baking process, Nanoelectromechanical devices, Nanometer thickness, Optical channels, Process parameters, Resolution enhancement, Silicon wafer substrates, UV lithography
Divisions
photonics
Publication Title
Microsystem Technologies
Volume
24
Issue
3
Publisher
Springer Verlag (Germany)