Physical and dispersive optical characteristics of ZrON/Si thin-film system
Document Type
Article
Publication Date
6-1-2014
Abstract
To date, the complex evaluation of physical and dispersive optical characteristics of the ZrON/Si film system has yet been reported. Hence, ZrON thin films have been formed on Si(100) substrates through oxidation/nitridation of sputtered metallic Zr in N2O environment at 500, 700, and 900 ∘C. Physical properties of the deposited films have been characterized by X-ray diffractometry (XRD), Fourier transform infrared (FTIR) spectroscopy, reflection high-energy electron diffraction (RHEED), and spectroscopic ellipsometry (SE). It has been shown that ZrON/Si thin films without optical absorption can be prepared by oxidation/nitridation reaction in N2O environment at 700–900 ∘C.
Keywords
Physical, Dispersive, Optical, Characteristics, ZrON/Si thin-film system
Divisions
fac_eng
Publication Title
Applied Physics A
Volume
115
Issue
3
Publisher
Springer