Investigation of optical and structural properties of ion-assisted deposition (IAD) ZrO2 thin films
Document Type
Article
Publication Date
11-1-2013
Abstract
Zirconium dioxide thin films were deposited onto fused silica glass substrates by electron-beam assisted by oxygen ions using high vacuum coater equipped with electron beam gun at ambient substrate temperature. The properties of the films have been investigated using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), micro-hardness testing, laser induced damage threshold (LIDT) and optical analysis. It is found that the crystalline phase is strongly influenced by ion energy and current density and an amorphous to monoclinic transition is occurred. The changes in crystallinity resulted in increase in the film micro-hardness up to19GPa, revealed in minimum residual stress -2GPa. LIDT increased up to 19 J/cm2 and the optical refractive index improved up to 2.23 at 550 nm wavelength for films deposited at ion energy of 400eV and 100μA/cm2 current density.
Keywords
IAD, ZrO2 coating, Laser induced damage threshold, Residual stress
Divisions
fac_eng
Publication Title
International Journal of Precision Engineering and Manufacturing
Volume
14
Issue
11
Publisher
Springer Verlag (Germany)