Formation of gold nanoparticles in silicon suboxide films prepared by plasma enhanced chemical vapour deposition
Document Type
Article
Publication Date
1-1-2011
Abstract
Nanostructured materials fabricated by dispersing metal particles on the dielectric surface have potential application in the field of nanotechnology. Interfacial metal particles/dielectric matrix interaction is important in manipulating the structural and optical properties of metal/dielectric films. In this work, a thin layer of gold (Au) was sputtered onto the surface of silicon oxide, SiO(x) (0.38
Keywords
Gold nanoparticles Silicon suboxide (SiOx) Surface Plasmon Resonance (SPR) Plasma enhanced chemical vapour deposition (PECVD) ion-implanted silica thin-films oxide-films nanocomposites fabrication absorption ag
Divisions
PHYSICS
Publication Title
Thin Solid Films
Volume
519
Issue
15
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