Structural and mechanical properties of nanostructured TiO2 thin films deposited by RF sputtering
Document Type
Article
Publication Date
1-1-2010
Abstract
This study mainly aims to evaluate the effects of substrate temperatures on the mechanical properties of TiO2 thin films deposited on glass substrates by radio-frequency (RF) magnetron sputtering. All titania films possess anatase structure having a nodular morphology. AES results reveal that Si and Na ions from glass diffuse into TiO2 films at higher substrate temperatures Micro-scratch and wear tests were conducted to evaluate their mechanical and tribological properties The adhesion critical loads of TiO2 films deposited at room temperature, 200 and 300 degrees C are found to be 1.51, 1.54 and 1.08 N. respectively Scratch hardness also Increases from 11.5 to 13 6 GPa with increasing temperature The wear track width decreases with substrate temperature indicating an improved wear resistance at higher temperatures (C) 2010 Elsevier B.V. All rights reserved.
Keywords
Structural properties, Adhesion strength, Scratch hardness, Tribological properties
Divisions
fac_eng
Publication Title
Surface and Coatings Technology
Volume
205
Issue
2
Publisher
Elsevier
Additional Information
Haseeb, A. S. M. A. Hasan, M. M. Masjuki, H. H.