Influence of substrate temperatures on structural, morphological and optical properties of rf-sputtered anatase TiO2 films

Document Type

Article

Publication Date

1-1-2010

Abstract

In this investigation, TiO2 thin films were deposited on glass substrates at varying substrate temperatures from room temperature to 300 degrees C by radio-frequency (RF) magnetron sputtering at an elevated sputtering pressure of 3 Pa. As-deposited TiO2 films were characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), field emission Auger electron microscopy (FEAES), and UV-visible-NIR spectrophotometry. The XRD results reveal that all the as-deposited films possessing the anatase structure and crystallinity of TiO2 films appears to deteriorate slightly at higher substrate temperatures. The crystallite size of the as-deposited films at different substrate temperatures is similar to 44 nm, which shows insignificant variation. AFM images exhibit a similar type of nodular morphology in the as-grown films. TiO2 films deposited at different substrate temperatures exhibit high visible transmittance and a high refractive index ranging from 2.31 to 2.37 at a wavelength of 550 nm. The optical band gap of the films has been estimated to be in the range from 3.39 to 3.42 eV.

Keywords

Titanium dioxide radio-frequency (rf) sputtering structural properties optical properties chemical-vapor-deposition thin-films photocatalytic activity annealing temperature microstructure fabrication constants thickness pressure plasma

Publication Title

Arabian Journal for Science and Engineering

ISSN

1319-8025

Divisions

fac_eng

Volume

35

Issue

1C

Additional Information

Hasan, M. M. Haseeb, A. S. M. A. Masjuki, H. H. Saidur, R. Hamdi, M.

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