Effects of annealing treatment on optical properties of anatase TiO2 thin films
Document Type
Article
Publication Date
1-1-2008
Abstract
In this investigation, anatase TiO2 thin films were grown by radio frequency magnetron sputtering on glass substrates at a high sputtering pressure and room temperature. The anatase films were then annealed at 300-600 °C in air for a period of 1 hour. To examine the structure and morphology of the films, X-ray diffraction (XRD) and atomic force microscopy (AFM) methods were used respectively. From X-ray diffraction patterns of the TiO 2 films, it was found that the as-deposited film showed some differences compared with the annealed films and the intensities of the peaks of the crystalline phase increased with the increase of annealing temperature. From AFM images, the distinct variations in the morphology of the thin films were also observed. The optical constants were characterized using the transmission spectra of the films obtained by UV-VIS-IR spectrophotometer. Besides, optical thickness of the film deposited at room temperature was calculated
Keywords
Titanium dioxide, RF reactive sputtering, Structural properties, Surface morphology, Optical properties
Divisions
fac_eng
Publication Title
International Journal of Chemical and Biological Engineering
Volume
1
Publisher
World Academy of Science, Engineering and Technology (WASET)